Silicon Technologies. Ion Implantation and Thermal Treatment
Автор
Annie Baudrant
ISBN
9781118601112
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Fatal error: Uncaught Error: Call to a member function fetch_row() on false in /home/user/web/тумба.онлайн/private/versions/ver_5/pages/books_single.php:285
Stack trace:
#0 /home/user/web/тумба.онлайн/private/versions/ver_5.php(577): include()
#1 /home/user/web/тумба.онлайн/public_html/index.php(200): include('...')
#2 {main}
thrown in /home/user/web/тумба.онлайн/private/versions/ver_5/pages/books_single.php on line 285